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            图形化衬底DPSS

            2014-09-02

            2"DPSS

            Inspection

            Item

            Detail

            Spec

            Description

            SEM
            Image
            Inspection

            Width

            Average

            2.70±0.15um

            Flat-top shaped pattern not allowed

            Unif.

            5%

            Height

            Average

            1.65±0.15um

            Unif.

            5%

            Scope Inspection

            Particle

            50um*

            100ea

            No visible particle on wafer
            The total lens should be less than 3mm

            [50um,250um]*

            30ea

            [250um,500um]*

            20ea

            [500um,1500um]*

            10ea

            1500um*

            0

            Pattern Missing

            50um*

            80ea

            The total length shoud be less than 2mm

            [50um,250um]*

            30ea

            [250um,500um]*

            15ea

            [500um,1500um]*

            8ea

            1500um*

            0

            Pattern Fail

            50um*

            80ea

            [50um,250um]*

            30ea

            [250um,500um]*

            15ea

            [500um,1500um]*

            8ea

            1500um*

            0

            Scratch

            1.2mm

            7ea

            width60um and lenth1.2mm should be judged as 1ea
            if the pattern link happenes in the nearest 20 patternes area from the scratch,the pattern link should not be counted

            Edge Bead

            Edge Bead

            1.8mm

            The pattern failed within the 1.8mm area from the wafer edge should not be counted
            The non-pattern area should be less than1mm from the wafer edge

            Abnormal Shape

            Abnormal Shape

            3%

            Total area of abormal shape pattern should be less than 3%

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